R&D Center
Current Position:HOME > R&D Center > Testing Platform

S4800 Field emission SEM

 

This machine is widely used in all kinds of metal materials and non-metallic materials testing
and research. In many fields of scientific research materials , metal materials, chemical materials,
semiconductor materials , ceramic materials , etc., it may conduct material microstructure observation,
organization, component analysis, material fracture analysis and failure analysis ; morphology observed
organize various materials ; materials real-time micro- component analysis ; rapid multi-element surface scan and line scan distribution measurements ; grain size , shape analysis , crystal , crystal orientation measurement ; elements of qualitative and quantitative composition analysis ; phase identification crystal grains.

Technical parameters:
Secondary electron Resolution : 1.4nm (1 kV, deceleration mode ) 1.0nm (15kV)
Electron optics :
Electron gun: cold field emission electron source
Acceleration voltage : 0.5 ~ 30kV (0.1KV / step variable )
Magnification : x 20 ~ x 800,000
Lens aperture : 4 holes , vacuum outside the selection and adjustment ( built-in heater )
Detector: secondary electron detector ( high / low ) transmission electron detector cathode fluorescent
detector Faraday cup
The sample stage : l Type :
X: 0 ~ 50mm Y: 0 ~ 50mm Z: 1.5 ~ 30mm T: -5 ~ +70 ° R: 360 °
Driver : manual ( optional 3 -axis drive )
Scan Mode : Standard , Split / dual mag / line scan, position set, spot, AAF, SAA, oblique.
Screen Storage : 640 x 480, 1,280 x 960, 2,560 x 1,920,5,120 x 3,840
Scan speed : TV, slow (0.5 ~ 40 s / frame ) used to observe a slow (40 ~ 320 s / frame ) for recording
Imaging process : automatic adjustment of brightness and contrast
Raster rotation, auto focus, auto astigmatism correction ,
Average , frame integration , pseudo-color display
Automatic data record: No film , accelerating voltage , micron scale magnification , date , time, working distance
Electronic image movement : ± 12u (W.D. = 8 mm)

 

Main features:
1-A new objective lens design with "Super ExB Filter" technology. Using a single detector, the Super ExB Filter collects and separates the various components of pure SE, compositional SE and BSE electron signals.
2-A guaranteed resolution of 1.4 / 2.0 nm at 1kV (deceleration / standard mode) for low voltage applications.
3-Type II specimen stage for large sample applications with 110mm x 110mm stage movement and computer
controlled 5 axes motorization with graphical interface software.

 

Copyright © Suzhou Saifei Group Ltd. All rights reserved. ICP: 13061365-1